Your Ally for Silicon-Based Photoresists and Antireflective Coatings

Customized Silicon Resins For Advanced Lithography Applications

As a trusted supplier of materials and technology for electronics applications for more than 60 years, we understand the challenges of advanced lithography processing to achieve device feature sizes of 65 nm and below. That is why we are developing customized silicon resin solutions to help leading lithography material suppliers and end-users attain levels of performance and versatility that were previously out of reach – strengthening your ability to innovate and excel.

Dow Corning offers you decades of commercial experience with silicon-based semiconductor materials and applications – including SOD (Spin-on Dielectrics) and CVD (Chemical Vapor Deposition). Whether it is finding solutions for photoresist pattern collapse or achieving the finest features possible, Dow Corning’s proven capabilities of technical innovation, material performance and global supply reliability are helping to meet your most challenging application needs:

193 nm Photoresists 193 nm Antireflective Coatings E-beam Resists More Information: We Are Silicon Lithography Solutions (PDF size = 405 KB) Sign-up for Lithography Updates Technical Articles Learn more about semiconductor fabrication.